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Fig. 7 | EURASIP Journal on Image and Video Processing

Fig. 7

From: Optimum design of chamfer masks using symmetric mean absolute percentage error

Fig. 7

Octant portion of the chamfer polygon generated by a 7×7 mask. l1:(d−3a)y+ax=r, l2:(3c−2d)y+(dc)x=r, l3:(2e−3c)y+(2ce)x=r, and l4:(3be)y+(e−2b)x=r. AOE=45 and corner points are \(A(\frac {r}{a},0)\), \(B(\frac {3r}{d},\frac {r}{d})\), \(C(\frac {2r}{c},\frac {r}{c})\), \(D(\frac {3r}{e},\frac {2r}{e})\), \(E(\frac {r}{b},\frac {r}{b})\), \(P(\frac {r}{d-c},0)\), \(Q(\frac {r}{2c-e},0)\), and \(R(\frac {r}{e-2b},0)\)

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