Skip to main content
Fig. 4 | EURASIP Journal on Image and Video Processing

Fig. 4

From: Optimum design of chamfer masks using symmetric mean absolute percentage error

Fig. 4

Octant portion of the chamfer polygon generated by a 5×5 mask. Lines that overlap the polygon’s sides are defined by l1:(c−2a)y+ax=r and l2:(2bc)y+(cb)x=r. Critical corner points are \(A\left (\frac {r}{a},0\right)\), \(C\left (\frac {r}{b},\frac {r}{b}\right)\), \(E\left (\frac {2r}{c},\frac {r}{c}\right)\), and \(F\left (\frac {r}{c-b},0\right)\). For the Euclidean local neighborhood, a=1, \(b=\sqrt {2}\), and \(c=\sqrt {5}\)

Back to article page