Fig. 2From: Optimum design of chamfer masks using symmetric mean absolute percentage errorOctant portion of the chamfer polygon generated by a 3×3 mask. \(\overline {AC}\) and \(\overline {A'C'}\) satisfy the equation l:(b−a)y+ax=r, where a and b represent local distances of the mask. a Euclidean weights, A=(r,0) and \(C=\left (\frac {r}{\sqrt {2}}, \frac {r}{\sqrt {2}}\right)\). b Optimized weights, \(A^{\prime } = \left (\frac {r}{a}, 0\right), C^{\prime } = \left (\frac {r}{b}, \frac {r}{b}\right)\), and \(\overline {OA^{\prime }} = \overline {OC^{\prime }}\)Back to article page